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Sapphire Substrate Polishing Slurry
Price: | US$ 10 / Set |
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Minimum Order: | |
Payment Terms: | T/T |
Port of Export: |
Product Details
Model No.: | Brand Name: | Kona |
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Certification: | |
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Specification: |
Kona developed silica colloidal for sapphire substrate final polishing, also provides alumina slurry for sapphire substrate rough and final polishing.
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Packaging & Delivery
Packaging: | |
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Delivery/Lead Time: | 5 working days |
Production Capacity: |
Product Description
Sapphire Substrate Polishing Slurry
Sapphire wafer is the most widely used substrate material in the semiconductor lighting industry, we developed Silica Colloidal and Alumina Slurry for sapphire substrate polishing.
Kona's Sapphire Substrate Polishing Slurry is designed to meet the demanding requirements of polishing sapphire substrates. Our colloidal silica slurries provide a superior surface finish with no compromise on polishing rates. With high-purity raw materials, our alumina slurries are idealy designed for C-plane sapphire with a fast removal rate and controlled surface finish. The slurry range is available in a wide range of particle sizes to cater to different polishing needs, including fine and rough polishing. Additionally, our Sapphire Substrate Polishing Slurry is compatible with various polishing machines and pads and provides cost-effective solutions for sapphire substrate polishing.
SAPPHIRE SUBSTRATE POLISHING SLURRY FEATURES
Sapphire Substrate is a kind of extremely hard semiconductor substrates, Kona engineering developed Sphere Substrate Polishing Slurry, including colloidal silica and alumina slurry.
In most cases, diamond abrasives is used for sapphire grading. However, which leaves scratches and other strains on the sapphire surface. So sapphire substrates need to be polished use colloidal silica or alumina slurry.
Kona sapphire colloidal silica polishing suspension especially developed for Sapphire, with increased abrasive particle size, which can improve the removal rate as well as no compromise with high quality surface.
Our aluminium rough and final polishing slurry developed for C- Plane Sapphire, with a fast removal rate and controlled surface finish.
DETAILS OF SAPPHIRE SUBSTRATE POLISHING SLURRY
Sapphire substrate is currently the mainstream substrate used for UV LED. Common size of sapphire substrates are 2", 4" and 6". Sapphire substrate has the characteristics of good light transmittance, high temperature resistance, corrosion resistance and high commercialization maturity.
Kona developed silica colloidal for sapphire substrate final polishing, also provides alumina slurry for sapphire substrate rough and final polishing.
Pro Name Silica colloidal for sapphire
Base Abrasive Silica Colloidal
Appearance White liquid
PH 9-12
Solvent Type Water-based
Shelf Life 12 months
Pro Name C-plane sapphire polishing slurry
Base Abrasive Alumina
Appearance White slurry
PH 9-14
Solvent Type Water-based
Shelf Life 12 months
SUPPLIER PROFILE
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Company: | Changsha Kona Fine Chemical Co.,Ltd | ||
City/State | Suzhou, jiangsu | Country: |
China ![]() |
Business Type: | Export - Manufacturer / Trading Company | Established: | NA |
Member Since: | 2024 | Contact Person | Serena Zuo |
SUPPLIER PROFILE
City/State/Country -
Suzhou, jiangsu
China 

Business Type -
Export - Manufacturer / Trading Company
Established -
NA
Member Since -
2024
Contact Person -
Serena Zuo